Photoresist
Photoresist is a kind of corrosion resistant film material whose solubility changes through the irradiation or radiation of ultraviolet light, electron beam, ion beam, X-ray, etc. Its components include: photoinitiator (including photosensitizer, photoacid generator), photoresist resin, solvent and other additives.
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Introduction

Photoresist is a kind of corrosion resistant film material whose solubility changes through the irradiation or radiation of ultraviolet light, electron beam, ion beam, X-ray, etc. Its components include: photoinitiator (including photosensitizer, photoacid generator), photoresist resin, solvent and other additives.

Features

Resin is the skeleton of photoresist. Shengquan photoresist is based on self-produced resin and has the following advantages::
  • Good etching resistance: The company's self-produced photoresist resin is used, and the etching time of strong acid is ≥2400sec

  • Cost-effective: self-produced resin, cost advantage

  • The process window is wide: the product has strong adaptability and the process window is wide.

  • Environmental protection: use phenolic resin system and water-based developer.

Applications

At present, it is mainly used in fine pattern processing fields such as GPP (glass passivation protective layer components), LED chips, display panels, integrated circuits and semiconductor discrete devices.

Quality & Service

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